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At 173 K, the dication of the title compound, C24H28Cl2N4Si2+·2I3-·CHCl3, is located on a crystallographic fourfold rotation axis. The chloro ligands occupy axial positions and the four 4-methyl­pyridine ligands lie in the equatorial plane. The almost linear I3- ion is located on a crystallographic mirror plane and displays two significantly different I-I bond lengths. Furthermore, chloro­form mol­ecules, which are disordered about a centre of inversion, fill the remaining gaps in the crystal structure.

Supporting information

cif

Crystallographic Information File (CIF) https://doi.org/10.1107/S0108270100002791/ln1099sup1.cif
Contains datablocks I, global

hkl

Structure factor file (CIF format) https://doi.org/10.1107/S0108270100002791/ln1099Isup2.hkl
Contains datablock I

pdf

Portable Document Format (PDF) file https://doi.org/10.1107/S0108270100002791/ln1099sup3.pdf
Supplementary material

CCDC reference: 145560

Comment top

The extension of silicon's coordination sphere in compounds formed from silicon halides and organic nitrogen bases has been of scientific interest over a long period of time (Hensen et al., 1983; Bechstein et al., 1990; Chuit et al., 1993; Kane et al., 1998; Hensen et al., 1998; Hensen, Mayr-Stein, Stumpf et al., 2000). Neutral adducts as well as cationic complexes have been characterized. Silylium ions have played an important part in recent research efforts in the area of silicon chemistry (Belzner, 1997; Reed, 1998). Most known ionic complexes contain charge stabilizing alkyl ligands bound to the silicon centre. Only recently, the first ligand stabilized SiH22+-dications (Fleischer et al., 1996; Hensen et al., 1998) and SiCl22+-dications (Hensen, Mayr-Stein, Stumpf et al., 2000) were found. These were prepared using the strong nitrogen base N-methylimidazole as a stabilizing ligand. In the work presented in this paper we have prepared a ligand stabilized SiCl22+-dication by introducing iodine as a suitable leaving group which enabled the use of a common pyridine derivative as ligand. The title compound, (I), was synthesized from SiCl2I2 and the unidentate ligand 4-methylpyridine. \sch

(I) shows a sixfold coordinated silicon centre, with only insignificant deviations from ideal octahedral symmetry (Fig. 1). The four 4-methylpyridine ligands are located in the equatorial plane and two chloro ligands occupy axial positions. The SiCl2 moiety is located on a crystallographic fourfold rotation axis, as a result of that, there is only a quarter of the molecule in the asymmetric unit. The two Si—Cl bonds are of equal length. The I3- ion is located on a crystallographic mirror plane, it is nearly linear, but the two I—I bonds are significantly different. A search in the Cambridge Crystallographic Database (CSD, Version 5.18, October 1999; Allen & Kennard, 1993) revealed that the two I—I bond lengths in I3- anions are usually equal, but different bond lengths are not uncommon. The resulting gaps in the crystal structure, located around the sites with crystallographic 2/m symmetry, are filled with chloroform molecules (see experimental section).

The only comparable compound published so far in the CSD, is trans-dichloro-tetra-(N-methylimidazolyl)silicon, of which three different crystal structures were obtained (Hensen, Mayr-Stein, Stumpf et al., 2000): one with chloride as counterion and chloroform as solvent, and two with bromide as counterion, but with chloroform and acetonitrile, respectively, as solvent. Whereas the mean Si—N bond in these structures [1.90 (1) Å] is a little bit shorter than in the title compound the mean Si—Cl bond [2.19 (1) Å] is slightly longer.

A comparison of the title compound with the related hydride structures dihydrido-tetrakis(3-picoline)-silicon dichloride (Fleischer et al., 1996), (dichloro-dihydro-dipyridyl)silane, (dichloro-dihdyro-bis(3-picoline))silane and (dihydro-tetrapyridyl)silane (Hensen et al., 1998) revealed that the Si—N bond length is nearly independent of the kind of the nitrogen base ligand, but the Si—Cl bond is considerable longer [2.2881 (4) and 2.2922 (4) Å], when the central Si atom is bonded to two H atoms instead of two nitrogen bases.

Experimental top

Due to the silicon halides' extreme susceptibility to hydrolysis all operations were carried out under an inert gas atmosphere. Also, exposition of SiCl2I2 to light was minimized. 4-Methylpyridine (5.0 mmol) was added dropwise to SiCl2I2 (1 mmol) in n-pentane (20 ml). The yellow precipitate was separated. Elemental analysis of the substance as well as thermochemical observations revealed that less than the expected four equivalents of the nitrogen base reacted to form a complex. Dismutation of SiCl2I2 (Hass et al., 1989) occurred during the preparation of the complex leading to a mixture of product complexes with varying stoichiometry with respect to halide distribution and silicon halide/methylpyridine ratio. We were able to crystallize two component complexes from the moderately soluble product powder: SiCl4(4-methylpyridine)2 (Hensen, Mayr-Stein, Spangenberg & Bolte, 2000) and the title compound from a hot chloroform solution that was allowed to evaporate at room temperature under vacuum over two weeks. The unexpected presence of I3- indicates side reactions with air.

Refinement top

All H atoms were initially located by difference Fourier synthesis. Subsequently their positions were idealized and constrained to ride on their parent atoms with C—H(aromatic) = 0.95 and CH(methyl) = 0.98 Å, and fixed individual displacement parameters [U(H) = 1.2 Ueq(Caromatic) or U(H) = 1.5 Ueq(Cmethyl)]. The methyl group was allowed to rotate about its local threefold axis

The C atom, the H atom and one Cl atom of the chloroform are located on a crystallographic mirror plane, one Cl atom occupies a general position. Due to the chloroform's position so close to a crystallographic inversion centre, another chloroform molecule is generated by the symmetry operation -x,1 - y,1 - z. Since the existance of both chloroform molecules is mutually exclusive, the chloroform site was refined as half occupied.

Computing details top

Data collection: SMART (Siemens, 1995); cell refinement: SMART; data reduction: SAINT (Siemens, 1995); program(s) used to solve structure: SHELXS97 (Sheldrick, 1997); program(s) used to refine structure: SHELXL97 (Sheldrick, 1997); molecular graphics: XP in SHELXTL-Plus (Sheldrick, 1991).

Figures top
[Figure 1] Fig. 1. Perspective view of the title compound with the atom numbering; displacement ellipsoids are at the 50% probability level.
(I) top
Crystal data top
C24H28Cl2N4Si2+·2I3·CHCl3Dx = 2.239 Mg m3
Mr = 1352.26Mo Kα radiation, λ = 0.71073 Å
Tetragonal, I4/mCell parameters from 8014 reflections
Hall symbol: -I 4θ = 0–25°
a = 16.241 (2) ŵ = 5.03 mm1
c = 15.210 (3) ÅT = 173 K
V = 4011.8 (11) Å3Block, dark red
Z = 40.30 × 0.25 × 0.25 mm
F(000) = 2496
Data collection top
Siemens CCD three-circle
diffractometer
2392 independent reflections
Radiation source: fine-focus sealed tube1957 reflections with I > 2σ(I)
Graphite monochromatorRint = 0.048
ω scansθmax = 27.5°, θmin = 1.8°
Absorption correction: empirical
(SADABS; Sheldrick, 1996)
h = 2121
Tmin = 0.244, Tmax = 0.284k = 2121
47624 measured reflectionsl = 1919
Refinement top
Refinement on F2Primary atom site location: structure-invariant direct methods
Least-squares matrix: fullSecondary atom site location: difference Fourier map
R[F2 > 2σ(F2)] = 0.041Hydrogen site location: inferred from neighbouring sites
wR(F2) = 0.096H atoms treated by a mixture of independent and constrained refinement
S = 1.05 w = 1/[σ2(Fo2) + (0.0306P)2 + 56.0581P]
where P = (Fo2 + 2Fc2)/3
2392 reflections(Δ/σ)max < 0.001
113 parametersΔρmax = 3.21 (0.87 Å from I1) e Å3
0 restraintsΔρmin = 3.36 e Å3
Crystal data top
C24H28Cl2N4Si2+·2I3·CHCl3Z = 4
Mr = 1352.26Mo Kα radiation
Tetragonal, I4/mµ = 5.03 mm1
a = 16.241 (2) ÅT = 173 K
c = 15.210 (3) Å0.30 × 0.25 × 0.25 mm
V = 4011.8 (11) Å3
Data collection top
Siemens CCD three-circle
diffractometer
2392 independent reflections
Absorption correction: empirical
(SADABS; Sheldrick, 1996)
1957 reflections with I > 2σ(I)
Tmin = 0.244, Tmax = 0.284Rint = 0.048
47624 measured reflections
Refinement top
R[F2 > 2σ(F2)] = 0.0410 restraints
wR(F2) = 0.096H atoms treated by a mixture of independent and constrained refinement
S = 1.05 w = 1/[σ2(Fo2) + (0.0306P)2 + 56.0581P]
where P = (Fo2 + 2Fc2)/3
2392 reflectionsΔρmax = 3.21 (0.87 Å from I1) e Å3
113 parametersΔρmin = 3.36 e Å3
Special details top

Experimental. The data collection nominally covered a sphere of reciprocal space, by a combination of seven sets of exposures; each set had a different ϕ angle for the crystal and each exposure covered 0.3° in ω. The crystal-to-detector distance was 4.5 cm. Coverage of the unique set is 100% complete to at least 26.4° in θ. Crystal decay was monitored by repeating the initial frames at the end of data collection and analyzing the duplicate reflections.

Geometry. All e.s.d.'s (except the e.s.d. in the dihedral angle between two l.s. planes) are estimated using the full covariance matrix. The cell e.s.d.'s are taken into account individually in the estimation of e.s.d.'s in distances, angles and torsion angles; correlations between e.s.d.'s in cell parameters are only used when they are defined by crystal symmetry. An approximate (isotropic) treatment of cell e.s.d.'s is used for estimating e.s.d.'s involving l.s. planes.

Refinement. Refinement of F2 against ALL reflections. The weighted R-factor wR and goodness of fit S are based on F2, conventional R-factors R are based on F, with F set to zero for negative F2. The threshold expression of F2 > σ(F2) is used only for calculating R-factors(gt) etc. and is not relevant to the choice of reflections for refinement. R-factors based on F2 are statistically about twice as large as those based on F, and R- factors based on ALL data will be even larger.

Fractional atomic coordinates and isotropic or equivalent isotropic displacement parameters (Å2) top
xyzUiso*/UeqOcc. (<1)
I10.14429 (4)0.18595 (6)0.00000.0680 (2)
I20.32278 (4)0.21330 (3)0.00000.03722 (15)
I30.49661 (4)0.25259 (4)0.00000.0574 (2)
Si10.50000.50000.25243 (16)0.0234 (5)
Cl10.50000.50000.39316 (14)0.0269 (5)
Cl20.50000.50000.11163 (15)0.0313 (5)
N10.3882 (2)0.4535 (2)0.2526 (3)0.0252 (8)
C20.3300 (3)0.4824 (3)0.3092 (3)0.0281 (10)
H20.34480.52430.34980.034*
C30.2504 (3)0.4531 (3)0.3096 (3)0.0293 (10)
H30.21140.47550.34950.035*
C40.2265 (3)0.3909 (3)0.2517 (3)0.0307 (10)
C410.1396 (3)0.3593 (4)0.2482 (4)0.0408 (13)
H41A0.12110.34540.30770.061*
H41B0.13740.31000.21110.061*
H41C0.10360.40180.22350.061*
C50.2869 (3)0.3610 (3)0.1958 (4)0.0327 (11)
H50.27390.31780.15600.039*
C60.3655 (3)0.3930 (3)0.1969 (3)0.0301 (11)
H60.40510.37180.15700.036*
C1L0.0293 (14)0.4854 (14)0.50000.066 (6)0.50
H1L0.04250.42780.50000.079*0.50
Cl110.1226 (3)0.5443 (3)0.50000.0478 (10)0.50
Cl120.0250 (3)0.5080 (4)0.4047 (3)0.0854 (15)0.50
Atomic displacement parameters (Å2) top
U11U22U33U12U13U23
I10.0444 (4)0.1221 (7)0.0376 (3)0.0101 (4)0.0000.000
I20.0508 (3)0.0391 (3)0.0217 (2)0.0024 (2)0.0000.000
I30.0513 (4)0.0572 (4)0.0635 (4)0.0111 (3)0.0000.000
Si10.0260 (8)0.0260 (8)0.0184 (12)0.0000.0000.000
Cl10.0316 (7)0.0316 (7)0.0175 (10)0.0000.0000.000
Cl20.0380 (8)0.0380 (8)0.0180 (10)0.0000.0000.000
N10.027 (2)0.026 (2)0.0229 (19)0.0008 (16)0.0015 (16)0.0035 (16)
C20.031 (2)0.028 (2)0.025 (2)0.0011 (19)0.0006 (19)0.0052 (19)
C30.029 (2)0.030 (3)0.029 (2)0.005 (2)0.004 (2)0.003 (2)
C40.031 (3)0.030 (3)0.032 (3)0.001 (2)0.006 (2)0.002 (2)
C410.031 (3)0.044 (3)0.048 (3)0.004 (2)0.005 (2)0.003 (3)
C50.038 (3)0.028 (2)0.032 (3)0.003 (2)0.005 (2)0.006 (2)
C60.032 (3)0.032 (3)0.026 (2)0.002 (2)0.000 (2)0.009 (2)
C1L0.077 (16)0.052 (13)0.067 (14)0.016 (11)0.0000.000
Cl110.042 (2)0.061 (3)0.041 (2)0.0071 (19)0.0000.000
Cl120.076 (3)0.102 (4)0.078 (3)0.004 (3)0.035 (2)0.006 (3)
Geometric parameters (Å, º) top
I1—I22.9327 (10)C41—H41B0.9800
I2—I32.8944 (10)C41—H41C0.9800
Si1—N11.967 (4)C5—C61.379 (7)
Si1—N1i1.967 (4)C5—H50.9500
Si1—N1ii1.967 (4)C6—H60.9500
Si1—N1iii1.967 (4)C1L—C1Liv1.06 (4)
Si1—Cl12.140 (3)C1L—Cl12v1.455 (5)
Si1—Cl22.142 (3)C1L—Cl12iv1.455 (5)
N1—C61.348 (6)C1L—Cl121.735 (12)
N1—C21.362 (6)C1L—Cl12vi1.735 (12)
C2—C31.378 (7)C1L—Cl111.79 (3)
C2—H20.9500C1L—H1L0.9600
C3—C41.395 (7)Cl11—Cl12v2.309 (7)
C3—H30.9500Cl11—Cl12iv2.309 (7)
C4—C51.386 (7)Cl12—Cl12v0.852 (8)
C4—C411.502 (7)Cl12—C1Liv1.455 (5)
C41—H41A0.9800Cl12—Cl11iv2.309 (7)
I3—I2—I1175.98 (3)C6—C5—H5119.5
N1—Si1—N1i90.000 (1)C4—C5—H5119.5
N1—Si1—N1ii179.8 (3)N1—C6—C5122.4 (5)
N1i—Si1—N1ii90.001 (1)N1—C6—H6118.8
N1—Si1—N1iii90.001 (1)C5—C6—H6118.8
N1i—Si1—N1iii179.8 (3)C1Liv—C1L—Cl12v85.7 (8)
N1ii—Si1—N1iii89.998 (1)C1Liv—C1L—Cl12iv85.7 (8)
N1—Si1—Cl189.92 (13)Cl12v—C1L—Cl12iv169.9 (17)
N1i—Si1—Cl189.92 (13)C1Liv—C1L—Cl1256.7 (6)
N1ii—Si1—Cl189.92 (13)Cl12v—C1L—Cl1229.3 (4)
N1iii—Si1—Cl189.92 (13)Cl12iv—C1L—Cl12142.4 (14)
N1—Si1—Cl290.08 (13)C1Liv—C1L—Cl12vi56.7 (6)
N1i—Si1—Cl290.08 (13)Cl12v—C1L—Cl12vi142.4 (14)
N1ii—Si1—Cl290.08 (13)Cl12iv—C1L—Cl12vi29.3 (4)
N1iii—Si1—Cl290.08 (13)Cl12—C1L—Cl12vi113.3 (12)
Cl1—Si1—Cl2180.0C1Liv—C1L—Cl11121 (3)
C6—N1—C2117.3 (4)Cl12v—C1L—Cl1190.0 (11)
C6—N1—Si1122.1 (3)Cl12iv—C1L—Cl1190.0 (11)
C2—N1—Si1120.6 (3)Cl12—C1L—Cl11108.4 (10)
N1—C2—C3122.4 (4)Cl12vi—C1L—Cl11108.4 (10)
N1—C2—H2118.8C1Liv—C1L—H1L129.5
C3—C2—H2118.8Cl12v—C1L—H1L94.8
C2—C3—C4120.6 (5)Cl12iv—C1L—H1L94.8
C2—C3—H3119.7Cl12—C1L—H1L108.7
C4—C3—H3119.7Cl12vi—C1L—H1L108.7
C5—C4—C3116.3 (5)Cl11—C1L—H1L109.3
C5—C4—C41121.6 (5)C1L—Cl11—Cl12v39.05 (15)
C3—C4—C41122.1 (5)C1L—Cl11—Cl12iv39.05 (15)
C4—C41—H41A109.5Cl12v—Cl11—Cl12iv77.7 (3)
C4—C41—H41B109.5Cl12v—Cl12—C1Liv93.9 (9)
H41A—C41—H41B109.5Cl12v—Cl12—C1L56.8 (6)
C4—C41—H41C109.5C1Liv—Cl12—C1L37.6 (14)
H41A—C41—H41C109.5Cl12v—Cl12—Cl11iv122.8 (7)
H41B—C41—H41C109.5C1Liv—Cl12—Cl11iv50.9 (11)
C6—C5—C4121.1 (5)C1L—Cl12—Cl11iv75.3 (8)
N1i—Si1—N1—C648.1 (5)Cl12iv—C1L—Cl11—Cl12v169.9 (17)
N1ii—Si1—N1—C6138 (100)Cl12—C1L—Cl11—Cl12v23.3 (4)
N1iii—Si1—N1—C6132.1 (3)Cl12vi—C1L—Cl11—Cl12v146.6 (16)
Cl1—Si1—N1—C6138.0 (4)C1Liv—C1L—Cl11—Cl12iv84.9 (8)
Cl2—Si1—N1—C642.0 (4)Cl12v—C1L—Cl11—Cl12iv169.9 (17)
N1i—Si1—N1—C2132.8 (3)Cl12—C1L—Cl11—Cl12iv146.6 (16)
N1ii—Si1—N1—C243 (100)Cl12vi—C1L—Cl11—Cl12iv23.3 (4)
N1iii—Si1—N1—C247.1 (4)C1Liv—C1L—Cl12—Cl12v169 (3)
Cl1—Si1—N1—C242.8 (4)Cl12iv—C1L—Cl12—Cl12v169 (3)
Cl2—Si1—N1—C2137.2 (4)Cl12vi—C1L—Cl12—Cl12v174.1 (19)
C6—N1—C2—C31.2 (7)Cl11—C1L—Cl12—Cl12v53.7 (12)
Si1—N1—C2—C3178.0 (4)Cl12v—C1L—Cl12—C1Liv169 (3)
N1—C2—C3—C40.9 (8)Cl12iv—C1L—Cl12—C1Liv0.001 (9)
C2—C3—C4—C50.3 (7)Cl12vi—C1L—Cl12—C1Liv4.7 (16)
C2—C3—C4—C41178.0 (5)Cl11—C1L—Cl12—C1Liv116 (3)
C3—C4—C5—C61.3 (8)C1Liv—C1L—Cl12—Cl11iv43 (3)
C41—C4—C5—C6177.1 (5)Cl12v—C1L—Cl12—Cl11iv147.3 (13)
C2—N1—C6—C50.2 (7)Cl12iv—C1L—Cl12—Cl11iv43 (3)
Si1—N1—C6—C5179.0 (4)Cl12vi—C1L—Cl12—Cl11iv38.6 (12)
C4—C5—C6—N11.1 (8)Cl11—C1L—Cl12—Cl11iv159.0 (10)
C1Liv—C1L—Cl11—Cl12v84.9 (8)
Symmetry codes: (i) y+1, x, z; (ii) x+1, y+1, z; (iii) y, x+1, z; (iv) x, y+1, z+1; (v) x, y+1, z; (vi) x, y, z+1.

Experimental details

Crystal data
Chemical formulaC24H28Cl2N4Si2+·2I3·CHCl3
Mr1352.26
Crystal system, space groupTetragonal, I4/m
Temperature (K)173
a, c (Å)16.241 (2), 15.210 (3)
V3)4011.8 (11)
Z4
Radiation typeMo Kα
µ (mm1)5.03
Crystal size (mm)0.30 × 0.25 × 0.25
Data collection
DiffractometerSiemens CCD three-circle
diffractometer
Absorption correctionEmpirical
(SADABS; Sheldrick, 1996)
Tmin, Tmax0.244, 0.284
No. of measured, independent and
observed [I > 2σ(I)] reflections
47624, 2392, 1957
Rint0.048
(sin θ/λ)max1)0.649
Refinement
R[F2 > 2σ(F2)], wR(F2), S 0.041, 0.096, 1.05
No. of reflections2392
No. of parameters113
H-atom treatmentH atoms treated by a mixture of independent and constrained refinement
w = 1/[σ2(Fo2) + (0.0306P)2 + 56.0581P]
where P = (Fo2 + 2Fc2)/3
Δρmax, Δρmin (e Å3)3.21 (0.87 Å from I1), 3.36

Computer programs: SMART (Siemens, 1995), SMART, SAINT (Siemens, 1995), SHELXS97 (Sheldrick, 1997), SHELXL97 (Sheldrick, 1997), XP in SHELXTL-Plus (Sheldrick, 1991).

Selected geometric parameters (Å, º) top
I1—I22.9327 (10)Si1—Cl12.140 (3)
I2—I32.8944 (10)Si1—Cl22.142 (3)
Si1—N11.967 (4)
I3—I2—I1175.98 (3)N1—Si1—Cl290.08 (13)
N1—Si1—Cl189.92 (13)C6—N1—C2117.3 (4)
 

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