Thin-film disorientation measurement using the single-crystal Nonius Kappa CCD diffractometer

The experimental procedure for the determination of disorientation of thin films relative to their substrate using the dedicated single-crystal Nonius Kappa CCD diffractometer is presented in this paper. This setup is applied to the analysis of polycrystalline ZnO films deposited on silicon, where the inclination of the piezoelectric film relative to the substrate is related to excitation of the shear wave mode in these resonators. Care must be taken with harmonic contamination arising from the sealed tube. Diffraction patterns were analysed with dedicated programs written in Fortran77.