Supporting information
Crystallographic Information File (CIF) https://doi.org/10.1107/S1600536807032151/hk2285sup1.cif | |
Structure factor file (CIF format) https://doi.org/10.1107/S1600536807032151/hk2285Isup2.hkl |
CCDC reference: 657800
The title compound, (I) was prepared by the literature method (Zielinska & Skulski, 2005). The crystals were obtained by dissolving (I) (0.5 g) in hexane (20 ml) and evaporating the solvent slowly at room temperature for about 7 d.
H atoms were positioned geometrically, with N—H = 0.86 Å (for NH2) and C—H = 0.93 and 0.96 Å for aromatic and methyl H, respectively, and constrained to ride on their parent atoms, with Uiso(H) = xUeq(C,N), where x = 1.5 for methyl H, and x = 1.2 for all other H atoms.
The title compound, (I), contains amino and halogen groups, in which they can react with different groups to prepare various functional organic compounds. It is a kind of aromatic organic intermediate that can be used for many fields such as aromatic conductive polymers, organometallic chemistry etc. (Zielinska & Skulski, 2005). We herein report its crystal structure.
In the molecule of (I), (Fig. 1), the bond lengths and angles (Table 1) are within normal ranges (Allen et al., 1987), which can be compared with the corresponding values in 2-iodo-N-(3-nitrobenzyl)aniline (Glidewell et al., 2002). The atoms I, N and methyl carbons lie in the benzene ring plane.
In the crystal structure, intermolecular N—H···N hydrogen bonds (Table 2) may be effective in the stabilization of the structure, the molecules are stacked along the a axis (Fig. 2).
For bond-length data, see: Allen et al. (1987). For related literature, see: Zielinska & Skulski (2005); Glidewell et al. (2002).
Data collection: CAD-4 Software (Enraf-Nonius, 1985); cell refinement: CAD-4 Software; data reduction: XCAD4 (Harms & Wocadlo, 1995); program(s) used to solve structure: SHELXS97 (Sheldrick, 1997a); program(s) used to refine structure: SHELXL97 (Sheldrick, 1997a); molecular graphics: PLATON (Spek, 2003); software used to prepare material for publication: SHELXTL (Sheldrick, 1997b).
C8H10IN | Dx = 1.846 Mg m−3 |
Mr = 247.07 | Melting point: 324 K |
Orthorhombic, P212121 | Mo Kα radiation, λ = 0.71073 Å |
Hall symbol: P 2ac 2ab | Cell parameters from 25 reflections |
a = 4.841 (1) Å | θ = 10–13° |
b = 11.389 (2) Å | µ = 3.53 mm−1 |
c = 16.128 (3) Å | T = 298 K |
V = 889.2 (3) Å3 | Needle, white |
Z = 4 | 0.40 × 0.20 × 0.20 mm |
F(000) = 472 |
Enraf-Nonius CAD-4 diffractometer | 867 reflections with I > 2σ(I) |
Radiation source: fine-focus sealed tube | Rint = 0.000 |
Graphite monochromator | θmax = 25.9°, θmin = 2.2° |
ω/2θ scans | h = 0→5 |
Absorption correction: ψ scan (North et al., 1968) | k = 0→14 |
Tmin = 0.306, Tmax = 0.496 | l = 0→19 |
1036 measured reflections | 3 standard reflections every 120 min |
1036 independent reflections | intensity decay: 1% |
Refinement on F2 | Secondary atom site location: difference Fourier map |
Least-squares matrix: full | Hydrogen site location: inferred from neighbouring sites |
R[F2 > 2σ(F2)] = 0.050 | H-atom parameters constrained |
wR(F2) = 0.144 | w = 1/[σ2(Fo2) + (0.08P)2 + 4P] where P = (Fo2 + 2Fc2)/3 |
S = 1.00 | (Δ/σ)max < 0.001 |
1036 reflections | Δρmax = 0.62 e Å−3 |
93 parameters | Δρmin = −0.89 e Å−3 |
0 restraints | Absolute structure: Flack (1983), no Friedel pairs |
Primary atom site location: structure-invariant direct methods | Absolute structure parameter: 0.16 (13) |
C8H10IN | V = 889.2 (3) Å3 |
Mr = 247.07 | Z = 4 |
Orthorhombic, P212121 | Mo Kα radiation |
a = 4.841 (1) Å | µ = 3.53 mm−1 |
b = 11.389 (2) Å | T = 298 K |
c = 16.128 (3) Å | 0.40 × 0.20 × 0.20 mm |
Enraf-Nonius CAD-4 diffractometer | 867 reflections with I > 2σ(I) |
Absorption correction: ψ scan (North et al., 1968) | Rint = 0.000 |
Tmin = 0.306, Tmax = 0.496 | 3 standard reflections every 120 min |
1036 measured reflections | intensity decay: 1% |
1036 independent reflections |
R[F2 > 2σ(F2)] = 0.050 | H-atom parameters constrained |
wR(F2) = 0.144 | Δρmax = 0.62 e Å−3 |
S = 1.00 | Δρmin = −0.89 e Å−3 |
1036 reflections | Absolute structure: Flack (1983), no Friedel pairs |
93 parameters | Absolute structure parameter: 0.16 (13) |
0 restraints |
Geometry. All e.s.d.'s (except the e.s.d. in the dihedral angle between two l.s. planes) are estimated using the full covariance matrix. The cell e.s.d.'s are taken into account individually in the estimation of e.s.d.'s in distances, angles and torsion angles; correlations between e.s.d.'s in cell parameters are only used when they are defined by crystal symmetry. An approximate (isotropic) treatment of cell e.s.d.'s is used for estimating e.s.d.'s involving l.s. planes. |
Refinement. Refinement of F2 against ALL reflections. The weighted R-factor wR and goodness of fit S are based on F2, conventional R-factors R are based on F, with F set to zero for negative F2. The threshold expression of F2 > σ(F2) is used only for calculating R-factors(gt) etc. and is not relevant to the choice of reflections for refinement. R-factors based on F2 are statistically about twice as large as those based on F, and R- factors based on ALL data will be even larger. |
x | y | z | Uiso*/Ueq | ||
I | 0.9368 (2) | 0.13850 (9) | 0.90849 (5) | 0.0746 (4) | |
N | 1.380 (2) | 0.1794 (9) | 0.5450 (6) | 0.056 (3) | |
H0A | 1.4925 | 0.2344 | 0.5312 | 0.067* | |
H0B | 1.3201 | 0.1311 | 0.5081 | 0.067* | |
C1 | 0.982 (3) | −0.0018 (11) | 0.5800 (8) | 0.069 (4) | |
H1A | 0.9108 | 0.0430 | 0.5344 | 0.103* | |
H1B | 0.8381 | −0.0499 | 0.6027 | 0.103* | |
H1C | 1.1303 | −0.0510 | 0.5609 | 0.103* | |
C2 | 1.602 (3) | 0.3380 (10) | 0.6666 (8) | 0.054 (3) | |
H2A | 1.5346 | 0.3866 | 0.6224 | 0.081* | |
H2B | 1.7700 | 0.3002 | 0.6496 | 0.081* | |
H2C | 1.6372 | 0.3855 | 0.7146 | 0.081* | |
C3 | 1.385 (2) | 0.2443 (8) | 0.6879 (7) | 0.041 (2) | |
C4 | 1.286 (3) | 0.2360 (10) | 0.7675 (7) | 0.050 (3) | |
H4A | 1.3503 | 0.2874 | 0.8079 | 0.060* | |
C5 | 1.095 (3) | 0.1533 (9) | 0.7877 (6) | 0.045 (2) | |
C6 | 0.994 (2) | 0.0768 (11) | 0.7285 (7) | 0.056 (3) | |
H6A | 0.8615 | 0.0215 | 0.7429 | 0.067* | |
C7 | 1.092 (3) | 0.0824 (9) | 0.6476 (6) | 0.046 (3) | |
C8 | 1.293 (2) | 0.1686 (9) | 0.6277 (6) | 0.040 (2) |
U11 | U22 | U33 | U12 | U13 | U23 | |
I | 0.0877 (7) | 0.0859 (6) | 0.0504 (5) | −0.0028 (6) | 0.0114 (5) | 0.0090 (4) |
N | 0.060 (7) | 0.058 (5) | 0.050 (5) | 0.000 (5) | 0.001 (5) | 0.012 (4) |
C1 | 0.085 (11) | 0.051 (6) | 0.070 (8) | −0.018 (7) | 0.008 (8) | −0.007 (6) |
C2 | 0.047 (7) | 0.048 (6) | 0.066 (7) | −0.017 (6) | 0.000 (6) | −0.007 (5) |
C3 | 0.034 (6) | 0.039 (5) | 0.050 (5) | 0.007 (5) | −0.002 (5) | −0.004 (4) |
C4 | 0.051 (7) | 0.045 (5) | 0.055 (6) | −0.006 (6) | −0.002 (6) | 0.004 (5) |
C5 | 0.052 (7) | 0.041 (5) | 0.043 (5) | 0.003 (6) | 0.001 (5) | 0.002 (4) |
C6 | 0.049 (8) | 0.057 (6) | 0.061 (7) | −0.005 (6) | 0.004 (6) | 0.013 (6) |
C7 | 0.044 (6) | 0.043 (5) | 0.051 (6) | 0.012 (6) | −0.019 (6) | −0.002 (5) |
C8 | 0.028 (5) | 0.047 (6) | 0.045 (5) | 0.002 (5) | 0.001 (4) | −0.004 (4) |
I—C5 | 2.101 (10) | N—H0A | 0.8600 |
C1—C7 | 1.545 (16) | N—H0B | 0.8600 |
C1—H1A | 0.9600 | C8—C3 | 1.372 (14) |
C1—H1B | 0.9600 | C8—C7 | 1.421 (16) |
C1—H1C | 0.9600 | C7—C6 | 1.389 (16) |
C2—C3 | 1.537 (15) | C6—C5 | 1.380 (17) |
C2—H2A | 0.9600 | C6—H6A | 0.9300 |
C2—H2B | 0.9600 | C5—C4 | 1.359 (16) |
C2—H2C | 0.9600 | C4—C3 | 1.373 (16) |
N—C8 | 1.404 (14) | C4—H4A | 0.9300 |
C7—C1—H1A | 109.5 | N—C8—C7 | 118.7 (9) |
C7—C1—H1B | 109.5 | C6—C7—C8 | 118.4 (10) |
H1A—C1—H1B | 109.5 | C6—C7—C1 | 121.3 (11) |
C7—C1—H1C | 109.5 | C8—C7—C1 | 120.3 (10) |
H1A—C1—H1C | 109.5 | C5—C6—C7 | 120.1 (11) |
H1B—C1—H1C | 109.5 | C5—C6—H6A | 120.0 |
C3—C2—H2A | 109.5 | C7—C6—H6A | 120.0 |
C3—C2—H2B | 109.5 | C4—C5—C6 | 120.8 (10) |
H2A—C2—H2B | 109.5 | C4—C5—I | 121.7 (8) |
C3—C2—H2C | 109.5 | C6—C5—I | 117.5 (8) |
H2A—C2—H2C | 109.5 | C5—C4—C3 | 120.5 (11) |
H2B—C2—H2C | 109.5 | C5—C4—H4A | 119.7 |
C8—N—H0A | 120.0 | C3—C4—H4A | 119.7 |
C8—N—H0B | 120.0 | C8—C3—C4 | 120.4 (10) |
H0A—N—H0B | 120.0 | C8—C3—C2 | 120.0 (10) |
C3—C8—N | 121.4 (10) | C4—C3—C2 | 119.6 (10) |
C3—C8—C7 | 119.8 (10) | ||
C3—C8—C7—C6 | −0.6 (16) | C6—C5—C4—C3 | −0.7 (18) |
N—C8—C7—C6 | −176.2 (10) | I—C5—C4—C3 | −179.5 (9) |
C3—C8—C7—C1 | 178.8 (11) | N—C8—C3—C4 | 176.5 (11) |
N—C8—C7—C1 | 3.2 (16) | C7—C8—C3—C4 | 1.1 (16) |
C8—C7—C6—C5 | −0.5 (17) | N—C8—C3—C2 | −4.4 (16) |
C1—C7—C6—C5 | −179.9 (11) | C7—C8—C3—C2 | −179.8 (10) |
C7—C6—C5—C4 | 1.2 (18) | C5—C4—C3—C8 | −0.5 (17) |
C7—C6—C5—I | −180.0 (8) | C5—C4—C3—C2 | −179.5 (10) |
D—H···A | D—H | H···A | D···A | D—H···A |
N—H0A···Ni | 0.86 | 2.45 | 3.248 (12) | 155 |
Symmetry code: (i) x+1/2, −y+1/2, −z+1. |
Experimental details
Crystal data | |
Chemical formula | C8H10IN |
Mr | 247.07 |
Crystal system, space group | Orthorhombic, P212121 |
Temperature (K) | 298 |
a, b, c (Å) | 4.841 (1), 11.389 (2), 16.128 (3) |
V (Å3) | 889.2 (3) |
Z | 4 |
Radiation type | Mo Kα |
µ (mm−1) | 3.53 |
Crystal size (mm) | 0.40 × 0.20 × 0.20 |
Data collection | |
Diffractometer | Enraf-Nonius CAD-4 |
Absorption correction | ψ scan (North et al., 1968) |
Tmin, Tmax | 0.306, 0.496 |
No. of measured, independent and observed [I > 2σ(I)] reflections | 1036, 1036, 867 |
Rint | 0.000 |
(sin θ/λ)max (Å−1) | 0.615 |
Refinement | |
R[F2 > 2σ(F2)], wR(F2), S | 0.050, 0.144, 1.00 |
No. of reflections | 1036 |
No. of parameters | 93 |
H-atom treatment | H-atom parameters constrained |
Δρmax, Δρmin (e Å−3) | 0.62, −0.89 |
Absolute structure | Flack (1983), no Friedel pairs |
Absolute structure parameter | 0.16 (13) |
Computer programs: CAD-4 Software (Enraf-Nonius, 1985), CAD-4 Software, XCAD4 (Harms & Wocadlo, 1995), SHELXS97 (Sheldrick, 1997a), SHELXL97 (Sheldrick, 1997a), PLATON (Spek, 2003), SHELXTL (Sheldrick, 1997b).
I—C5 | 2.101 (10) | N—C8 | 1.404 (14) |
C3—C8—N | 121.4 (10) | C4—C5—I | 121.7 (8) |
N—C8—C7 | 118.7 (9) | C6—C5—I | 117.5 (8) |
D—H···A | D—H | H···A | D···A | D—H···A |
N—H0A···Ni | 0.86 | 2.45 | 3.248 (12) | 155.3 |
Symmetry code: (i) x+1/2, −y+1/2, −z+1. |
The title compound, (I), contains amino and halogen groups, in which they can react with different groups to prepare various functional organic compounds. It is a kind of aromatic organic intermediate that can be used for many fields such as aromatic conductive polymers, organometallic chemistry etc. (Zielinska & Skulski, 2005). We herein report its crystal structure.
In the molecule of (I), (Fig. 1), the bond lengths and angles (Table 1) are within normal ranges (Allen et al., 1987), which can be compared with the corresponding values in 2-iodo-N-(3-nitrobenzyl)aniline (Glidewell et al., 2002). The atoms I, N and methyl carbons lie in the benzene ring plane.
In the crystal structure, intermolecular N—H···N hydrogen bonds (Table 2) may be effective in the stabilization of the structure, the molecules are stacked along the a axis (Fig. 2).