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Resonant X-ray reflectivity can combine the layer sensitivity of the reflectivity technique with the chemical composition sensitivity of the absorption technique. The idea is demonstrated through a depth profile study of the chemical composition of a multi-element thin-film system at the soft X-ray spectral range near the boron K absorption edge. The composition profile of a multi-element low-contrast (<0.6%) thin film is determined from the free surface to buried interfaces within a few atomic percentages of precision and with a nanometre depth resolution.