On the characterization of ultra-precise X-ray optical components: advances and challenges in ex situ metrology

State-of-the-art ex situ metrology for characterizing the quality of ultraprecise reflective synchrotron optics is reported. Beside slope measuring deflecometry the current state of mirror coating technology for single layer and multilayer coatings for very long mirror substrates is discussed.

Hard X-ray nanofocusing at low-emittance synchrotron radiation sources

X-ray scanning microscopy greatly benefits from a reduced emittance of synchrotron radiation sources, especially from a diffraction-limited storage ring. Nanofocusing is discussed in view of focus size, flux and coherence.