Journal of Applied Crystallography
Journal of Applied
Crystallography
IUCr
IT
WDC
search IUCr Journals
home
archive
editors
for authors
for readers
submit
subscribe
open access
journal menu
home
archive
editors
for authors
for readers
submit
subscribe
open access
research papers
Share
Share
Issue contents
Article statistics
Download citation
Format
BIBTeX
EndNote
RefMan
Refer
Medline
CIF
SGML
Text
Plain Text
Download PDF of article
J. Appl. Cryst.
(2014).
47
,
335-345
https://doi.org/10.1107/S1600576713030951
Download PDF of article
Download citation
Format
BIBTeX
EndNote
RefMan
Refer
Medline
CIF
SGML
Text
Plain Text
Article statistics
Issue contents
Share
Analysis of stress gradients in physical vapour deposition multilayers by X-ray diffraction at fixed depth intervals
G. Fischer
,
U. Selvadurai
,
J. Nellesen
,
T. Sprute
and
W. Tillmann
The objective of this article is to develop and apply a model for the design and evaluation of X-ray diffraction experiments to measure phase-specific residual stress profiles in multilayer systems.
Keywords:
residual stress measurement
;
depth dependency of residual stress
;
constant penetration depths
;
multilayer systems
;
Ti/TiAlN
.
Read article
Similar articles
Follow J. Appl. Cryst.
E-alerts
Twitter
Facebook
RSS