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Depth profile investigation of Fe-implanted Si(100) has been carried out using extremely asymmetric X-ray diffraction. Owing to its higher surface sensitivity compared to X-ray reflectivity, a decrease of the mass density close to the surface was found for increasing ion fluence, which is explained by the formation of ion-induced near-surface defects.

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A self-assembly process is demonstrated that results in the formation of an anisotropic lattice of regularly ordered Ge quantum dots in an amorphous alumina matrix. The prepared material shows a strong anisotropy of the electrical transport properties.
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