Download citation
Download citation

link to html
Anomalous dispersion at the Si K edge is used to control the refractive index of an Si substrate to match that of a polymer thin film on its surface. Diffuse scattering from the film/substrate interface disappears at a photon energy very close to the Si absorption edge.
Follow J. Appl. Cryst.
Sign up for e-alerts
Follow J. Appl. Cryst. on Twitter
Follow us on facebook
Sign up for RSS feeds