Full-field X-ray reflection microscopy of epitaxial thin-films

The novel capabilities of a newly designed full-field X-ray reflection microscope to image a thin film with 70 nm resolution and sub-second exposures are demonstrated.

An unconventional method for measuring the Tc L₃-edge of technetium compounds

Embedding Tc oxides in epoxy allows measurement of the Tc L-edge spectra under UHV conditions. Changes in the Tc L-edge XANES spectra provide information on the oxidation state, crystal field splitting and coordination environment.