Journal of Synchrotron Radiation
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J. Synchrotron Rad.
(1999).
6
,
524-525
https://doi.org/10.1107/S0909049599001247
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Download citation
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XAFS studies of Al/TiN
x
films on Si(100) at the Al
K
- and
L
3,2
-edge
Z. Zou
,
Y. F. Hu
,
T. K. Sham
,
H. H. Huang
,
G. Q. Xu
,
C. S. Seet
and
L. Chan
Keywords:
Al K-edge
;
Al L-edge
;
diffusion barrier
;
thin films
;
TiN
x
.
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