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High-resolution X-ray diffraction in coplanar and noncoplanar geometries has been used to investigate the influence of an SiNx nano-mask in the reduction of the threading dislocation density of high-quality AlGaN epitaxial layers grown on sapphire substrates.

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The microcrack propagation and cleavage behaviour in silicon wafers during thermal annealing has been studied by in situ X-ray diffraction imaging (topography).

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Several ways of tuning a higher asymmetry factor (>10) in V-channel X-ray monochromators, for metrological and imaging applications, were analysed. A more than sixfold intensity increase for compositionally and thermally tuned cases was achieved.

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V–Al–C–N hard coatings with high carbon content were deposited by reactive radio-frequency magnetron sputtering from a segmented sputter target. The composition-dependent coexisting phases were analysed using the complementary methods of X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), X-ray absorption near-edge spectroscopy (XANES) and extended X-ray absorption fine-structure spectroscopy (EXAFS).

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Three-dimensional reciprocal space mapping is found to be a powerful and crucial method for the analysis of diffuse scattering originating from stacking faults that are diffracting in a noncoplanar geometry. The technique could be used to confirm transmission electron microscopy visibility criteria and to distinguish the origins of diffuse scattering signals.
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