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High-resolution X-ray diffraction in coplanar and noncoplanar geometries has been used to investigate the influence of an SiNx nano-mask in the reduction of the threading dislocation density of high-quality AlGaN epitaxial layers grown on sapphire substrates.

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Three-dimensional reciprocal space mapping is found to be a powerful and crucial method for the analysis of diffuse scattering originating from stacking faults that are diffracting in a noncoplanar geometry. The technique could be used to confirm transmission electron microscopy visibility criteria and to distinguish the origins of diffuse scattering signals.
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