Development of a simultaneous measurement system for SAXS-WAXD and the thickness of coating films during film formation by solvent evaporation

A new simultaneous measurement system for small-angle X-ray scattering and wide-angle X-ray diffraction (SAXS-WAXD) and the thickness of coating films, and a data correction method for the scattering invariant from SAXS during solvent evaporation, are presented. The correction was important when investigating the film formation mechanism on drying.