Optimization of a bent perfect Si(111) mono­chromator at a small take-off angle for use in a stress instrument

It is shown that for a stress instrument with small monochromator take-off angle (∼30°) the maximum figure of merit for angular accuracy of the diffraction line position, which is comparable to the instrument having a take-off angle of ∼55°, can be achieved by optimizing a focusing Si(111) bent perfect crystal monochromator.