Journal of Applied Crystallography
Journal of Applied
Crystallography
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J. Appl. Cryst.
(2009).
42
,
999-1003
https://doi.org/10.1107/S0021889809040199
Download PDF of article
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Detection of the standing X-ray wavefield intensity inside a thin crystal using back-diffraction topography and imaging
M. G. Honnicke
and
C. Cusatis
The standing X-ray wavefield intensity of a single crystal, under dynamical diffraction conditions, is directly measured by setting a 50 µm-thick single-crystal CCD detector chip in nondispersive back-diffraction geometry.
Keywords:
standing X-ray wavefield intensity
;
X-ray back-diffraction
;
X-ray topography
.
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