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Thin diamond microplates have been grown on dome-like/hemispherical carbon particles on titanium carbide by a microwave plasma chemical vapour deposition (MPCVD) method using a gas mixture of methane and hydrogen. The diamond microplates have a thickness of about 200 nm. A thin (300 nm) film of titanium carbide was formed during carburization of sputtered titanium on an Si(100) substrate in MPCVD. The hemispherical carbon particles were covered with diamond microplates. The diamond microplates are isolated electron-emitting spherules and exhibit a low threshold (50 V µm-1) and high current density (0.92 mA cm-2) in their field emission properties. A possible mechanism for the formation of the diamond microplates and hemispherical carbon particles is presented.