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The morphological change of silver nano-particles (AgNPs) exposed to an intense synchrotron X-ray beam was investigated for the purpose of direct nano-scale patterning of metal thin films. AgNPs irradiated by hard X-rays in oxygen ambient were oxidized and migrated out of the illuminated region. The observed X-ray induced oxidation was utilized to fabricate nano-scale metal line patterns using sectioned WSi2/Si multilayers as masks. Lines with a width as small as 21 nm were successfully fabricated on Ag films on silicon nitride. Au/Ag nano-lines were also fabricated using the proposed method.

Supporting information

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Portable Document Format (PDF) file https://doi.org/10.1107/S1600577514023534/co5060sup1.pdf
Supporting information: (I) Behavior of silver nano-particles during X-ray exposure underoxygen-free environment. (II) Silver nano-particles exposed to hard X-rays in air with water vapor. (III) X-ray diffraction peaks of Ag oxide. (IV) Estimation of the hard X-ray flux.


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