Buy article online - an online subscription or single-article purchase is required to access this article.
Download citation
Download citation
link to html
Long-range, elastic strains emanating from stress raisers, such as holes and inclusions, were investigated in bent silicon crystals which functioned as a model material. The strains and strain interactions were characterized by X-ray Pendellösung fringe topography and were quantitatively evaluated by X-ray intensity measurements of transverse-oscillation topographs. Improvement of strain measurements were obtained by considering the contribution of anomalous transmission to the intensity measurements and by deposition of an appropriate metal film on the developed topograph to heighten the fluorescence of the silver grains in the emulsion. The strain gradient emanating from a bent specimen containing a hole was experimentally determined and the results were compared to calculations based on continuum mechanics having closed-form solution. Good agreement between experiment and theory was obtained. The dependence of strain interaction on interflaw distance was experimentally demonstrated for specimens containing two holes.

Subscribe to Journal of Applied Crystallography

The full text of this article is available to subscribers to the journal.

If you have already registered and are using a computer listed in your registration details, please email support@iucr.org for assistance.

Buy online

You may purchase this article in PDF and/or HTML formats. For purchasers in the European Community who do not have a VAT number, VAT will be added at the local rate. Payments to the IUCr are handled by WorldPay, who will accept payment by credit card in several currencies. To purchase the article, please complete the form below (fields marked * are required), and then click on `Continue'.
E-mail address* 
Repeat e-mail address* 
(for error checking) 

Format*   PDF (US $40)
In order for VAT to be shown for your country javascript needs to be enabled.

VAT number 
(non-UK EC countries only) 
Country* 
 

Terms and conditions of use
Contact us

Follow J. Appl. Cryst.
Sign up for e-alerts
Follow J. Appl. Cryst. on Twitter
Follow us on facebook
Sign up for RSS feeds