Journal of Applied Crystallography

Volume 32, Part 1 (February 1999)

research papers

J. Appl. Cryst. (1999). 32, 27-35 [ doi:10.1107/S0021889898009765 ]

X-ray diffraction study of concentration depth profiles of binary alloy coatings during thermal diffusion: application to brass coating

B. Bolle, A. Tidu and J. J. Heizmann

Abstract: Using the Houska method based on X-ray diffraction-line profile analysis, new mathematical treatments are proposed to compute directly the concentration depth profile of thin films obtained by diffusion. As an example, concentration depth profiles of a brass layer have been studied during the thermal diffusion process. This nondestructive method is fast (a few minutes) and allows the sample to be used for complementary analysis if necessary.