J. Appl. Cryst. (1998). 31, 589-593 [ doi:10.1107/S0021889898001071 ]
Abstract: Germanium nanostructures embedded in amorphous SiOx matrices were investigated by different X-ray techniques. We report either randomly distributed or layer-organized arrangements of the nanoclusters or nanocrystals, depending on the sputtering conditions. Recrystallization was found to occur by annealing the films near the melting point of germanium.
Copyright © International Union of Crystallography
IUCr Webmaster