Journal of Applied Crystallography

Volume 29, Part 5 (October 1996)

research papers

J. Appl. Cryst. (1996). 29, 531-539 [ doi:10.1107/S0021889896003809 ]

Thin-Film Study using Low-Incidence and Bragg-Brentano Texture Goniometry. Application to Mono- and Bilayers of Al and Al/Fe

A. Tizliouine, J. Bessières, J. J. Heizmann and J. F. Bobo

Abstract: Texture goniometry of thin layers needs intensity corrections in Bragg-Brentano or low-incidence geometries. These intensity corrections are described for the case where the diffracting volume consists of a single layer or bilayers. As an application, the respective orientations of aluminium thin films deposited on steel and bilayers of aluminium/iron deposited on silicon wafers are studied. The orientation relationship between iron and silicon is (111)_Si||(110)_Fe and between aluminium and iron is (111)_Al||(110_Fe) with [011]_Al||[100]_Fe.