J. Appl. Cryst. (2002). 35, 430-433 [ doi:10.1107/S0021889802006817 ]
Abstract: The internal reflection of an excited X-ray waveguide mode in a synthetic nanostructure, defined by electron-beam lithography, has been measured. In this device, the X-ray beam is first coupled into a conventional vertical thin-film waveguide structure and then reflected laterally at the quasi-one-dimensional edge of the waveguiding layer. The reflectivity of the quasi-one-dimensional interface has been recorded under simultaneous excitation of the (vertical) waveguide mode. The experiment constitutes an important step towards the production of a coherent nanometre-sized X-ray point source by two-dimensionally defined waveguide structures.
Keywords: waveguide; nanostructure; X-ray waveguide mode; internal reflection; optics.
Copyright © International Union of Crystallography
IUCr Webmaster